Shanghai Huai Chromatography Analysis Technology Co., Ltd. (Shanghai Huai Chromatography Analysis Technology Co., Ltd.)
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Plasma Emission Gas Chromatography System
Sa gas ye tɛmɛ electromagnetic field ye kɔnɔ, gas ye tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ. A bɛ elektron ni ion juëc b
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Plasma Emission Detector (Plasma Emission Detector)PED):

1.Diagram konstruksiyon detektor

Ionization room material is a quartz pool, at the two ends of the quartz pool with high frequency, high-strength electromagnetic field, the carrier gas carries the components separated by chromatic column into the quartz pool, in the high pressure, high-strength electromagnetic field action, the carrier gas and components are together ionized, forming a plasma.

Kä ye kek looi aye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye kek ye

2.Prinsip detektor

Sa gas ye tɛmɛ electromagnetic field ye kɔnɔ, gas ye tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ ka tɛmɛ. A bɛ elektron ni ion juëc bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi, ka bɛ̈n ya looi. Ka tɛ̈n yenë elektɛrɔn dɔ̈ɔ̈r ye tɔ̈u yen, ka tɛ̈n yenë elektɛrɔn dɔ̈ɔ̈r ye tɔ̈u yen, ka tɛ̈n yenë atom dɔ̈ɔ̈r ye tɔ An bɛ signal dɔw yök në radiation kënë yiic.

3.Karakteristika detektor

1(PPb)

2(Utility) High (Universal Detector)

3(Stability) High (material doesn't directly contact the electrode) Stability (material doesn't directly contact the electrode) Stability (material doesn't directly contact the electrode) Stability (material doesn't directly contact the electrode) Stability (material doesn't directly contact the electrode)

4(Radon tïŋ, oxygen argon tɛ̈ɛ̈r)

5(Main Peak Shield)

Teknik Indikator

1.Limits of detection (Limits of detection) (Limits of detection)ppb):

Grup Minut

H2

O2

N2

CH4

CO

CO2

Ne

ArLimit deteksyon gas

20

20

20

20

20

20

20

HeLimit deteksyon gas

0.5

0.5

0.5

0.5

1

0.5

1

2.Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control: Parameters of temperature control:

Temperature Range

Room temperature8℃-400℃

Temperature Control Precision

±0.1℃

Program Warming

8Layer

Rate of heating of the program (Rate of heating of the program)

1℃~40℃

Automatic Back Door

Yïn

Speed cooling

7Ha looi minit (350℃Ka50℃

3. Dimension, Weight, Power

Size

Width655mm×Yüksek500mm×Deep480mm

Weight ye

48kg

Power

220V±22V50Hz

Puwol

≥2kW

Sisitɛm:

1GC-9560Gas kromatogram

2(Plasma Emission Detector)PED

3(Central Cutting System)

4(Multi-column box system)

5(Purifier)

6(Gas standar)

7(Chromatography Column)

8(Valve de réduction de pression de gaz)

9(Valve Sampling Dedicated to No Dead Volume)

10GC-9560V4.0Version anti-control chromatography workstation

11VCRLinks(Option)

12O2ArSistɛm separation(Option)

13(Elektronik gas sampling system)(ye kuany);

A tɛ̈ɛ̈k ku ka tɛ̈ɛ̈k ke ye lööŋ ke bɛ̈ɛ̈i tɔ̈u:

1(High purity gas standard)

GB/T3634.2-2011"Hydrogen Pure, High Pure and Ultra Pure"GB/T 14599-2008"Oxygen Pure, High Pure and Ultra Pure"

GB/T 8979-2008"Nitrogen Pure, Nitrogen High Pure, Nitrogen Ultra Pure"GB/T 4842-2017Argon

GB/T 4844-2011"Helium Pure, Helium High Pure, Helium Ultra Pure"GB/T 17873-2014"Raw Pure and High Pure"

GB/T 5829-2006"Krypton"GB/T 5828-2006"Xenon"

GB/T 33102-2016"Methane Pure and High Pure" (Methane Pure and High Pure)

GB 1886 228-2016Standart Food Nation Additives ye kɔnɔ Karbon dioksid likid

GB/T 23938-2009"Karbon dioksid puɔth"

GB/T28125.1-2011"Kä ye kek yök në luɔɔi de kä ye kek yök në luɔɔi de kä ye kek yök në luɔɔi de kä ye kek yök në luɔɔi de kä ye kek yök"

2(Elektronik gas standard)

GB/T 16942Gas Industri Elektronik HidrogenGB/T 16943-2009Gas Industri Elektronik Helium

GB/T 16944Gas Industri Elektronik NitrogenGB/T 16945-2009Gas Industri Elektronik Argon

GB/T 14604Gas Industri Elektronik OxygenGB/T 14600-2009Gas Industri Elektronik Argon Nitrogen Oxide

GB/T 14601Gas Industri Elektronik AmmoniakGB/T18867-2014Gas Industri Elektronik Sulfur hexafluoride

GB/T 15909Gas Industri Elektronik SilikanGB/T 21287-2007Gas Industri Elektronik Nitrogen trifluoride

Oxygen argon separation technology:

Oxygen argon tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈

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