Yïïn: Fully Automatic Ion Sputtering Machine Model: ETD-800

Prinsip: Diode DC sputtering

Yic: Ion sputter Model: ETD-900M

Prinsip: Magnetron sputtering

Në magnetron sputtering, ka tɛ̈n yenë elektron ye tɛ̈n yenë Lorentz ye tɛ̈n yenë magnet ye tɛ̈n yenë magnet ye tɛ̈n yenë magnet ye tɛ̈n yenë magnet ye tɛ̈n yenë magnet ye

Raw spiral movement, a motion path becomes long, so increasing the number of times colliding with working gas molecules, so that the plasma density increases, so that the magnetron sputtering rate is greatly improved, and can work at low sputtering voltage and air pressure. Raw spiral movement, a motion path becomes long, so increasing the number of times colliding with working gas molecules, so that the plasma density increases, so that the magnetron sputtering rate is greatly improved, and can work at low sputtering voltage Në ye mɛn, të cenë elektron cï lëu bɛ̈n ya tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u ka tɔ̈ɔ̈u

ETD-800 Parameters:

Kuen: 260mm × 307mm × 260mm (W × D × H)

Power specification: 220V/50HZ

Target (upper electrode): 50mm × 0.1mm (D × H)

Target: Au

Vacuum Sample Room: Borosilicate Glass 115mm × 100mm (D × H)

Timer: zui Duration: 3600S

Pump: 1L/S

Zui Voltage: -1200 DCV

ETD-900M Parameters:

Kuen: 300mm × 360mm × 380mm (W × D × H)

Target (upper electrode): 50mm × 0.1mm (D × H)

Target: Au (ye gam)

Sample Room: Borosilicate Glass 160mm × 120mm (D × H)

Dimension target: Ф 50mm

真空指示表： zui 高真空度： ≤ 4X10-2 mbar

Ion Current Meter: zui Current: 50mA

Timer: zui Duration: 0-360S

Miniature vacuum air valve: lëu bï ya mat φ 3mm hose

Gas lëu bɛ̈n looi: suguya juëc

Zui Voltage: -1600 DCV

Pump: 2L/S (VRD-8)

Features and Uses: Kuen-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn-kuɛn

ETD-800 luɔɔi:

Lɔ̈ɔ̈ŋ ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈l ye kɛ̈

Features:

A lëu bï ya tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u tɔ̈u t

One-click operation, a yic a luɔɔi.

ETD-900M luɔɔi:

Scanning electron microscope (SEM) sample preparation for electroscopic labs, non-conductor materials experimental electrode production. A ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye.

Features:

1, ye yic, ye yic, ye yic, ye yic.

2, a lëu bï ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk ya cɔk

3, SETPLASMA manual start button can pre-set the pressure and sputtering current to avoid causing harm to the membrane. 3, SETPLASMA manual start button can pre-set the pressure and sputtering current to avoid causing harm to the membrane.

4, vacuum protection can prevent vacuum too low causing equipment short circuit. 4, vacuum protection can prevent vacuum too low causing equipment short circuit. 4, vacuum protection can prevent vacuum too low causing equipment short circuit. 4, vacuum protection can prevent vacuum too low causing equipment short circuit.

5, a lëu bï ya tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka tɔ̈u ka

6, ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi ka bɛ̈n looi.